X-ray photoelectron spectrometer (XPS)
PHI VersaProbe II
Physical Electronics Inc.
The PHI 5000 VersaProbe is a multi-technique surface analysis instrument based on PHI's highly successful scanning x-ray microprobe technology. This technology provides high performance XPS micro-area spectroscopy, chemical imaging, and secondary electron imaging with a raster scanned 10 µm diameter x-ray beam.
PHI's innovative and patented dual beam charge neutralization method provides turn-key analysis of insulating samples using a combination of low energy ions and electrons.
The integral floating column argon ion gun provides an impressive sputter depth profiling capability for inorganic thin film structures. The optional C60 ion gun provides a unique and powerful organic sputter depth profiling capability.
PHI's innovative and patented dual beam charge neutralization method provides turn-key analysis of insulating samples using a combination of low energy ions and electrons.
The integral floating column argon ion gun provides an impressive sputter depth profiling capability for inorganic thin film structures. The optional C60 ion gun provides a unique and powerful organic sputter depth profiling capability.
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