Measuring device for semiconductor industry S3000 CD™
Rudolph Technologies
The S3000 CD™ combines the excellent thin-film measurement accuracy, repeatability, and tool-to-tool matching of Rudolph's fab-wide Focused Beam™ technology tool, the S3000™, with new optical critical dimension (CD) measurements. Optical CD is a key process control technology for semiconductor manufacturers at the 90 nm technology node and below, where very small changes in transistor dimensions can result in significant reductions in device performance. Optical CD applications can be found in the litho, etch, and CMP modules.
