Sputtering PVD deposition machine for ophthalmic lens
SP-100
Satisloh
State of the art technology, working pressure achieved within 4 minutes, consistent uniform coatings - even on curved substrates, optimized deposition processes for different substrates, high deposition rates.
Based on many years of thin-film experience this sputtering system the SP-100 reflects the state of the art in precision pulse plasma sputtering technology. The single-target, reactive sputtering principle provides outstanding flexibility for process innovation and simplified operation.
Based on many years of thin-film experience this sputtering system the SP-100 reflects the state of the art in precision pulse plasma sputtering technology. The single-target, reactive sputtering principle provides outstanding flexibility for process innovation and simplified operation.
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