pressure monitoring system / process / gas
Stanford Research Systems
The PPR Process Monitoring System is best used for inline process monitoring as well as diagnostics. This unit is capable of providing two separate paths that lead to the residual gas analyzer (RGA), a high conductivity path and pressure reduction path. The first one serves to monitor the base vacuum, while the second one contains a micro-hole opening that works at pressures of 0.01, 0.1, 1 or 10 Torr, and is used for the observation of process at operating pressure. It is capable of reducing the sample pressure to the value that the RGA can handle, normally between 10 to 6 Torr. In order to accomplish this, two pumps are used the hybrid turbomolecular and a diaphragm pump.