Integrated-circuit mask-generation software Synopsys

This paper will focus specifically on Synopsys EDA software tools, process flows, and compute resources
used for the “Mask Data Preparation (or MDP)” process flow area of semiconductor manufacturing.
(Synopsys product; CATS®). Often referred to as the critical link from design to manufacturing CATS is a
software package which converts semiconductor design data into a useful format for making the circuit
templates (also referred to as “photomasks”) for semiconductor manufacturing. Topics discussed will include

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