PVD deposition machine Titan DepositionPECVDelectrostaticvacuum
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Characteristics
- Method
- PVD, PECVD, electrostatic
- Other characteristics
- vacuum
Description
The production proven Titan Deposition is a loadlocked deposition system with a vacuum cassette elevator. It can be configured for PECVD, HDCVD, PVD, or ALD. The Titan Deposition provides innovative, and leading edge processes in a small footprint at an affordable price.
Standard production processes have been developed for repeatable deposition of SiOx, SiNx, SiC, and a-Si. All backed by over 25 years’ experience in rapid process development.
System Features:
PLC and touch screen control
Electrostatic, or mechanical chuck
Active substrate temperature control
Vacuum Cassette Elevator
Optional laser, and optical endpoints
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See all of Trion Technology‘s catalogs*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.