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Diaphragm vacuum pump MD 4C NT +2AK
oil-freethree-stagefor gas

diaphragm vacuum pump
diaphragm vacuum pump
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Characteristics

Technology
diaphragm
Lubrication
oil-free
Number of stages
three-stage
Applications
for medical applications, for laboratories, for the chemical industry, for gas, chemical process, for pharmaceutical applications, for the plastics industry
Other characteristics
low-noise level, chemical-resistant
Ultimate vacuum

1.5 mbar, 3 mbar
(0.02 psi, 0.04 psi)

Flow rate

3.4 m³/h, 3.8 m³/h
(120.07 ft³/h, 134.2 ft³/h)

Power

0.25 kW
(0.34 hp)

Operating temperature

Max.: 60 °C
(140 °F)

Min.: -10 °C
(14 °F)

Length

319 mm
(13 in)

Width

243 mm
(9.57 in)

Height

374 mm
(14.72 in)

Noise level

45 dB

Weight

16.7 kg
(36.82 lb)

Description

This chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors in chemical, biological and pharmaceutical laboratories that do not require condensation of solvent vapors at the outlet. This system is well proven for high vacuum requirements with high boiling solvents. Typical applications are vacuum concentrators, rotary evaporators and drying ovens. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The catchpot at the outlet collects condensate, avoids condensate backflow towards the pump and reinforces the whisper-quiet operation of the pump. Performance features outstanding chemical resistance and superior vapor tolerance exceptionally high performance even at low vacuum excellent ultimate vacuum even with gas ballast whisper quiet and very low vibration separators at inlet and outlet to collect condensates

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Other VACUUBRAND products

Chemistry diaphragm pumps - Down to 1.5 mbar

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.
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