The Dimension X3D-PM Atomic Force Microscope is the newest line of automated AFM metrology specifically designed for Photomask applications. The system provides superior repeatability, high resolution and comprehensive profile and CD metrics on a variety of materials including chrome, quartz, MoSi and photoresist. The unique 3D-AFM technology is a high resolution non-destructive technique that is insensitive to material properties. The X3D-PM Atomic Force Microscope has fully automated mask handling for 150mm reticles using a SMIF loadport.
The Dimension X3D-PM Atomic Force Microscope provides the flexibility to gather detailed information in one tool for CD elements encountered in the most demanding mask manufacturing processes including:
Multiple CD of lines and spaces
Line and space depth metrology
Holes CD and depth
Sidewall angle on vertical and re-entrant profiles
Line width variability
Defect review for mask repair feedback
