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PVD deposition machine / ion beam-assisted
NEXUS IBD VEECO

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Characteristics

  • Method:

    PVD

  • Technology:

    ion beam-assisted

Description

This IBAD ion beam assisted PVD deposition machine is developed by VEECO. It is specifically designed to cater applications that include hard bias, lead, insulation layer and sensor stack deposition. This machine is equipped with a data storage to increase yield of 80 Gb/in2 sensors. In addition, it is using a FMH device fabrication with Veeco's third-generation NEXUS® Ion Beam Deposition (IBD) System. For its utilization, it delivers support on a broad selection of devices starting from current CIP to advanced CPP devices.