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ion sputtering source

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ion sputtering source ion sputtering source


Veeco offers a broad uniform ion beam source for reactive processes, such as ion beam assist or ion beam deposition of highly controlled optical coatings.

Supports wide range of operation: 50 to 1500eV and 75 to 700mA
Reliable, uniform operation in both inert and oxidizing environments
Water-cooled - For low-to-high power operation
Optional four-grid design offers very high collimation
Features the industry's only filamentless RF Neutralizer, which provides low maintenance and enables long production runs
Stable and efficient plasma operation allows precise control and high repeatability
Well-suited to both batch and load-locked production processes

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