ion sputtering source
Veeco Instruments presents Mark I+ gridless ion source. It delivers a high beam current, which is developed for vacuum coating applications in systems with diameter of 750mm or less. As a result, it enhances process consistency and avoids substrate damage. It is suitable for surface pre-cleaning, ion-beam assisted deposition (IAD) and a few etch applications.
Mark I+ is ideal for use with applications that demand high current, low-energy ions. The high beam current is particularly suited for managing film stress and stoichiometry. It is also suitable for industrial applications, such as reactive environments.
Mark I+ can be used with separately available Mark series ion source controller. The controller helps improve source performance and delivers a consistent and dependable process operation.