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PVD deposition machine / ion beam-assisted
NEXUS LDD-IBD VEECO

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Characteristics

  • Method:

    PVD

  • Technology:

    ion beam-assisted

Description

The NEXUS LDD-IBD Ion Beam Deposition System is designed to provide excellent particle control while depositing multiple layers of film structures. The system is suitable for multiple layers of depositions on EUV mask blanks. It is also applicable for other mask operations that require decreased level of defects and advanced thin films.

The NEXUS LDD-IBD features a production-proven design with the slightest defect density. It functions with good repeatability and uniformity. During operation, it has the capacity to deposit a number of materials in similar chambers.