Wafer cleaning machines

Wet processing of wafer / substrates / masks Cleaning, Developing, Striping, Etching, various chemical Processes incl. Piranha, HF, SC1 and SC2, Megasonic and Highpressure Stand alone and wet bench ...

... around removal & cleaning of the diffused silicon wafers. Process Flow Wrap Around Removal→Post-clean→Acid Clean→Post-clean→Acid Clean→Hot Water Drying→Drying (for reference) • Throughput: 400pcs/batch, ...

... Designed for the cleaning of single wafers up to 300mm/12″ Ideal for the cleaning of patterned and un-patterned, Germanium (Ge), Galluim Arsendie (GaAs) and Indium Phosphide (InP) wafers Perfect ...

This machine is a fully-automatic wafer cleaning machine, automatically operated by a manipulator in a closed environment, has cleaning and drying functions, ...

... dry post-polish cleaning system removes particles, contamination and creates perfectly clean wafer surfaces. The tool handles wafers up to 300 mm diameter. Whether full ...

wafer two-fluid centrifiigal cleaning machine, also called wafer cleaning equipment, bismuth telluride wafer cleaning ...