ALD deposition machine C30H ALD

parylene

Ideal for laboratory tests and industrial production of small pieces Perfectly suited for 3D complex-shaped components ALD deposition of Al2O3 and TiO2 Remote plasma source Gas panel with 4 heated precursors line as default, more on request. Overall dimensions (L x W x H) - 2250 x 1160 x 1450mm Weight - 350 kg Chamber size - ∅ 295 x 370 mm Tooling size - ∅ 260 x 320 mm Max. tooling load - 100kg Dimer load capacity - 150g Pumping capacity - 40 m3/h Power supply required - 3 x 400V + N + PE – 50 Hz 3 x 25A – 15kW Thermalized chamber - Temperature range: 20 – 80°C Power supply: 3 x 400V + PE – 50Hz 3x 14A – 9kW Remote Plasma Source - Frequency: 1.7 – 3MHz Power: 3000W In Situ RF capacitive Plasma Source - – Standard processable materials - Parylene: C, D, N, F-VT4, F-AF4 ALD: Al 2 O 3 , TiO Process temperature - Parylene: room temperature ALD: 60 – 80°C