Reflectance measurement system C11295

lightthicknessoptical

The Multipoint NanoGauge Thickness measurement system C11295 is a film thickness measurement system utilizing spectral interferometry. It is designed to measure film thickness as part of the semiconductor manufacturing process, as well as for quality control of the APC and films that are mounted on semiconductor manufacturing equipment. Allows multichannel measurement in real time, which provides simultaneous multichannel measurement and multipoint measurement on film surfaces. At the same time it can also measure reflectivity (transmittance), object color, and their changes over time. Features • Simultaneous film thickness measurement up to 15 points • Reference-free operation • Stable long-term measurement by correction of light intensity fluctuation • Alarm and warning function (pass/fail) • Reflectance (transmittance) and spectrum measurements • High speed and high accuracy • Real time measurement • Precise measurement of fluctuating film • Analyze optical constants (n, k) • External control available Specifications Type number : C11295-XX*1 Measurable film thickness range (glass) : 20 nm to 100 μm*2 Measurement reproducibility (glass) : 0.02 nm*3 *4 Measurement accuracy (glass) : ±0.4 %*4 *5 Light source : Xenon light source *6 Measurement wavelength : 320 nm to 1000 nm Spot size : Approx. φ1 mm*4 Working distance : 10 mm*4 Number of measurable layers : Max. 10 layers Analysis : FFT analysis, Fitting analysis Measurement time : 19 ms/point*7 Fiber connector shape : SMA Number of measurement points : 2 to 15 External control function : Ethernet Interface : USB 2.0 (Main unit - Computer) RS-232C (Light source - Computer) Power supply : AC100 V to AC240 V, 50 Hz/60 Hz