Optical measurement system C12562-04

thicknessgaugeautomatic

The Optical NanoGauge Thickness measurement system C12562 is a compact, space-saving, non-contact film thickness measurement system designed to easily install in equipment where needed. In the semiconductor industry, measuring silicon thickness is essential due to the spread of through-silicon via technology; and in the film production industry, adhesion layer films are being made ever thinner to meet product specifications. So these industries now require even higher accuracy in thickness measurements ranging from 1 μm to 300 μm. The C12562 allows making accurate measurements across a wide thickness range from 500 nm to 300 μm that include the thin film coating and film substrate thickness as well as the total thickness. The C12562 also offers rapid measurements up to 100 Hz making it ideal for measurements on high-speed production lines. Features Measures ranging from thin film thickness to the total thickness Shortens cycle time (max. 100 Hz) Enhanced external triggers (accommodates high-speed measurement) Simplified measurement is added to the software Capable of both surface analysis Precise measurement of fluctuating film Analyze optical constants (n, k) External control available Measurement principle: spectral interferometry Multiple reflections occur inside the thin film as light enters a thin film sample. These multiple-reflection light waves boost or weaken each other along with their phase difference. The phase difference of each multiple-reflection light is determined by the light wavelength and optical path length. Therefore, the reflected or transmitted spectrum from the sample shows a specific spectrum determined by the film thickness.