The inverted emission microscope is a backside analysis system designed to identify failure locations by detecting the light and heat emitted from the defects in semiconductor devices.
The signal detection from backside facilitates the use of probing and probe card to the wafer surface, and the sample setting can be performed smoothly. The platform, possible to mount multiple detectors and lasers, enables the selection of the optimum detector for performing various analysis methods such as light emission and heat generation analysis, IR-OBIRCH analysis, and others; moreover, letting dynamic analysis perform efficiently by tester connection.
●iPHEMOS-MP
Support for measurement from a single chip to a wafer by mounting a 300 mm wafer prober. Multi-pin needle contact by probe card and sample observation on PC board are available. Dynamic analysis with LSI tester drive is also possible by cable connection.
Features
• Two ultra-high sensitivity cameras mountable for emission analysis and thermal analysis
• Lasers for up to 3 wavelengths and a probe light source for EOP are mountable
• Multi-platform capable of mounting multiple detectors
• High sensitivity macro lens and up to 10 lenses suitable for each detector sensitivity wavelength
Options
• Includes laser scan system
• Emission analysis with high-sensitivity near-infrared camera
• Thermal analysis with high-sensitivity mid-infrared camera
• IR-OBIRCH analysis
• Dynamic analysis by laser irradiation
• EO probing analysis
• High-resolution and high-sensitivity analysis using NanoLens
• Connects to CAD Navigation
• Connects to LSI tester