The CellaCrystal PX 44 has been developed for optical temperature measurement in the production of Si and SiC crystals. The calibration is especially adapted to the growth process. Because of the hybrid signal evaluation with a constantly high resolution of < 0.1 K over the entire measuring range and the very high long-term stability thanks to the uniform light sensor technology, this device meets the high demands on the required measuring accuracy.
Special features:
Measuring range 750 to 3,000 °C
PX 44 AF 4: special calibration for the production of crystals of silicon
PX 44 AF 4: special calibration for the production of silicon carbide
hybrid signal evaluation for high metrological resolution
high long-term stability due to minimal self-heating
focusable lens for exact adjustment of the measuring distance
standard feature: IO-LINK interface and analogue output