Overlay Metrology Systems
The ATL100™ (Accurate Tunable Laser) scatterometry-based overlay metrology system provides overlay control for development and high volume manufacturing at ≤7nm design nodes. Tunable laser technology with 1nm resolution paired with real-time Homing™ maintains high overlay accuracy in the presence of production process variations. The ATL100 supports a diverse range of scatterometry overlay measurement target designs, including in-die and small pitch, enabling accurate overlay error measurement for different process layers, device types, design nodes and patterning technologies.
Applications
On-product overlay control, Inline monitoring, Scanner qualification, Patterning control, In-die measurements
Related Products
Archer: Imaging-based overlay metrology systems that provide high accuracy overlay measurements for development and high volume manufacturing at the ≤1Xnm design nodes.