inspection microscope / for materials research / for materials inspection / measuring
DM3 XL

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Characteristics

  • Technical applications:

    inspection, for materials research, for materials inspection, measuring, for production lines

  • Type:

    optical

  • Other characteristics:

    LED illumination, modular, ergonomic, for semiconductors, for flat samples, for wafers, sliding-stage, simple installation, for quality control, for polished samples, cost-effective, movable objective, with light intensity manager, for in-line wafer inspection

Description

Speed matters in inspection, process control, or defect and failure analysis for the microelectronics and semiconductor industry. The faster you detect a defect, the faster you can react.

With a large field of view, the DM3 XL inspection system allows your team to identify defects faster and increase your yield rate. Make use of the 30% increased field of view of the unique macro objective.

Additionally, the DM3 XL uses LED illumination for all contrast methods. LED illumination provides a constant color temperature and offers real color imaging at all intensity levels.

- Increase your yield
- Reliably detect insufficient development at the edge or within the center of a wafer
- Detect uneven radial film thickness
- True-to-life color imaging at all intensity levels
- Reproducible results