Magnetron sputtering deposition machine UNIvap

thermal evaporationion beam-assistedthin-film

• Standalone system • Compact and cost-effective solution • Easy configuration design • Co-deposition is possible • Uniformity up to +/-3 % (with specific geometry design up to +/1 %) • Two standard-sizes: UNIvap 4S and UNIvap 5S • Up to 8 deposition sources possible • Substrate size up to 100x100 mm or diam. 100 mm (4”) for UNIvap 4S • Substrate size up to 150x150 mm or diam. 150 mm (6”) for UNIvap 5S • OLEDs/Organic Electronics • OPVs