PVD deposition machine SP series
magnetron sputteringsilicon thin-filmvacuum

PVD deposition machine
PVD deposition machine
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Characteristics

Method
PVD
Technology
magnetron sputtering
Deposition type
silicon thin-film
Other characteristics
vacuum, with rotating cathodes, short-cycle, online, optical
Applications
for the microelectronics industry, automotive, for glass coatings, for photovoltaic applications, for mirrors, for displays, for reflective glass, glass lens, optical lens

Description

Our optical magnetron sputtering coating machine technology has a stable film forming system, and the supporting precise control method has been widely used by major companies. This type of equipment is equipped with a complete set of available chemical equipment to maximize customer productivity and efficiency. Our exclusive SI high ionization target source, helps complements the preparation of balanced high refractive film in production. This technology can produce AR+AF film and colorful gradient and optical film. This type of equipment has a low-temperature film forming form, which can be used for the production of surface films of various products. The equipment has fully automatic sputtering control mode, real-time monitors the state of the film, to achieve stable, batch production.
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.