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Deposition machine LPCVD

deposition machine
deposition machine
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Description

Equipment Name · Horizontal LPCVD Equipment Model · LD-350A/LD-360A/LD-420A Equipment Application · Mainly used for deposition of Poly-Si layer and in-situ doping in the production of c-si solar cells. Processing Steps ·Saw damage removal→Pre-cleaning→Mono-texturing→Post cleaning→Acid cleaning→Hot water drying→Drying (for reference only) Features ·Low pressure chemical vapor deposition. ·Multiple water-cooled tube sealing technology. ·Double-layer quartz tube structure. ·Independently regulated sectional air inlet. ·Translational furnace door driver mechanism. ·High-speed integral module boat pushing mechanism. ·Digital control. ·More temperature zone control. ·Intelligent automatic control. ·Alarm protection for over-heating, thermocouple-break and boat collision.
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.