· Horizontal LPCVD
· Mainly used for deposition of Poly-Si layer and in-situ doping in the production of c-si solar cells.
·Saw damage removal→Pre-cleaning→Mono-texturing→Post cleaning→Acid cleaning→Hot water drying→Drying (for reference only)
·Low pressure chemical vapor deposition.
·Multiple water-cooled tube sealing technology.
·Double-layer quartz tube structure.
·Independently regulated sectional air inlet.
·Translational furnace door driver mechanism.
·High-speed integral module boat pushing mechanism.
·More temperature zone control.
·Intelligent automatic control.
·Alarm protection for over-heating, thermocouple-break and boat collision.