Solar deposition machine LPCVD

Mainly used for deposition of Poly-Si layer and in-situ doping in the production of c-si solar cells. Processing Steps Saw damage removal→Pre-cleaning→Mono-texturing→Post cleaning→Acid cleaning→Hot water drying→Drying (for reference only) Features • Low pressure chemical vapor deposition. • Multiple water-cooled tube sealing technology. • Double-layer quartz tube structure. • Independently regulated sectional air inlet. • Translational furnace door driver mechanism. • High-speed integral module boat pushing mechanism. • Digital control. • More temperature zone control. • Intelligent automatic control. • Alarm protection for over-heating, thermocouple-break and boat collision.