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Annealing DOA-320L

annealing
annealing
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Description

Equipment Name · Horizontal Diffusion/Oxidation/Annealing Equipment Equipment Model · DOA-320L/ DOA-420 Equipment Application · The equipment is mainly used for doping and form PN junctions on silicon wafers in the manufacturing process of crystalline silicon solar cells. Processing Steps · Prepare quartz boat & wafers→ Insert wafers→ Loading wafers→ Choose recipe → Boat loading→ tube Vacuuming→ Temperature rising→ Oxygen inlet→Pocl3 inlet→ Push in→ DOA treatment→ Boat unloading→ Cooling→ Testing→ Wafer unloading. Features · Low pressure diffusion, oxidation and annealing. · High sheet resistance technology solution. · Patented technology, available for Boron diffusion. · Unique double-layer-embedment furnace door structure. · Patented technology for exhaust gas treatment system. · High-speed integral module boat pushing mechanism. · High precision air source pressure stabilization technology. · Intelligent automatic control. · MES software with independent intellectual property right. · Alarm protection for over-heating, thermocouple -break and boat collision. · Match S.C smart factory solution.
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.