· Horizontal Diffusion/Oxidation/Annealing Equipment
· DOA-320L/ DOA-420
· The equipment is mainly used for doping and form PN junctions on silicon wafers in the manufacturing process of crystalline silicon solar cells.
· Prepare quartz boat & wafers→ Insert wafers→ Loading wafers→ Choose recipe → Boat loading→ tube Vacuuming→ Temperature rising→ Oxygen inlet→Pocl3 inlet→ Push in→ DOA treatment→ Boat unloading→ Cooling→ Testing→ Wafer unloading.
· Low pressure diffusion, oxidation and annealing.
· High sheet resistance technology solution.
· Patented technology, available for Boron diffusion.
· Unique double-layer-embedment furnace door structure.
· Patented technology for exhaust gas treatment system.
· High-speed integral module boat pushing mechanism.
· High precision air source pressure stabilization technology.
· Intelligent automatic control.
· MES software with independent intellectual property right.
· Alarm protection for over-heating, thermocouple -break and boat collision.
· Match S.C smart factory solution.