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Annealing DOA-320L

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Equipment Name · Horizontal Diffusion/Oxidation/Annealing Equipment Equipment Model · DOA-320L/ DOA-420 Equipment Application · The equipment is mainly used for doping and form PN junctions on silicon wafers in the manufacturing process of crystalline silicon solar cells. Processing Steps · Prepare quartz boat & wafers→ Insert wafers→ Loading wafers→ Choose recipe → Boat loading→ tube Vacuuming→ Temperature rising→ Oxygen inlet→Pocl3 inlet→ Push in→ DOA treatment→ Boat unloading→ Cooling→ Testing→ Wafer unloading. Features · Low pressure diffusion, oxidation and annealing. · High sheet resistance technology solution. · Patented technology, available for Boron diffusion. · Unique double-layer-embedment furnace door structure. · Patented technology for exhaust gas treatment system. · High-speed integral module boat pushing mechanism. · High precision air source pressure stabilization technology. · Intelligent automatic control. · MES software with independent intellectual property right. · Alarm protection for over-heating, thermocouple -break and boat collision. · Match S.C smart factory solution.
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