· Batch Alkaline Polishing Equipment
· This equipment is used for polishing, etching and cleaning treatment of diffused wafers and also compatible for texturing and cleaning treatment of bifacial solar cells.
· Throughput: 400pcs/batch, 8000pcs/h.
· Compatible with rear side etch polishing and mono-crystalline rear side texturing process.
· Suitable for various additives.
· Wafer thickness down to 120um.
· With dry clean area and self-cleaning system.
· Quick inline bath change.
· Available with MES, RFID system, inline weight testing optional.