Removed impurities: N2, Ar, O2, CO, CO2, H2O, CH4
• Purification process: cryogenic adsorption
• Principle: The gas passes through adsorbent layer at very low temperature.
• Main domain of use: mobility, photovoltaic equipment, gas industry, semi-conductor industry…
Technical information:
• Pressure: up to 380 barg
• Outlet impurity level: < 10 ppb
• Semi automatic or automatic version (HMI/PLC)