Removed impurities: O2, H2O, H2
• Purification process: adsorption + catalysis
• Principle: The gas passes through a special catalyst and an adsorbent layer where impurities are removed.
• Main domain of use: semi-conductor industry, welding gas, protective gases…
Technical information:
• Pressure: up to 380 barg
• Outlet impurity level: < 10 ppb
• Semi automatic or automatic version (HMI/PLC)