Removed impurities: CH4, CO, CO2, H2O
• Purification process: catalysis + adsorption
• Principle: The gas passes through a special catalyst at high temperature to convert CH4, H2 and CO into H2O which will be trapped by an adsorbent layer.
• Main domain of use: chemical industry, fiber optic, semi-conductor, laboratories, metallurgical industries.
Technical information:
• Pressure: up to 380 barg
• Outlet impurity level: < 10 ppb
• Automatic version (HMI/PLC)