PVD deposition machine Multi950

PECVDsputteringvacuum

Compact Footprint, Standard Modular Design, Flexible, Reliable, Octal Chamber, 2-door structure for good access, PVD + PECVD processes. Design Features: 1. Flexibility: Arc and sputtering cathodes, Ion source mounting flanges are standardized for flexible exchange; 2. Versatility: can deposit variety of base metals and alloys; optical coatings, hard coatings, soft coatings, compound films and solid lubricating films on the metallic and non-metallic materials substrates. 3. Straight forward design: 2-door structure, front & back opening for easy maintenance. The Multi950 machine is a customized multiple functions vacuum deposition system for R&D. With half year’s discussion with Shanghai University’s team leaded by Professor Chen, we finally confirmed the design and configurations to fulfill theirs R&D applications. This system is able to deposit transparent DLC film with PECVD process, hard coatings on tools, and optical film with sputtering cathode. Based on this pilot machine design concept, we have developed 3 other coating systems after then: 1. Bipolar Plate Coating for Fuel Cell Electric Vehicles- FCEV1213, 2. Ceramic Direct Plated Copper- DPC1215, 3. Flexible Sputtering System- RTSP1215.