ALD deposition machine PD-520 series

thin-film

AlO+SiN Thin-film Deposition. • Atomic layer deposition process, with better film uniformity. • Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process steps and wafer breakage rate, improving yield effectively. • Independent R&D of liquid source precursor vapor delivery and precursor rapid switching technology. • Suitable for deposition of passivation layer for different precursors and materials, with a large space for process expansion.