Silicon lens element
MWIRopticallaser

silicon lens element
silicon lens element
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Characteristics

Material
silicon
Optical characteristics
MWIR
Applications
optical, laser, scanning
Diameter

Max.: 101.6 mm
(4 in)

Min.: 10 mm
(0.39 in)

Description

For more than 40 years, Sil'tronix Silicon Technologies produces its own monocrystalline silicon ingot in order to provide the highest quality for photonic applications. The whole products are made internally within our own factory in order to provide the flexibility requested regarding the application. We use exclusively pure silicon (9N) in order to maintain a reliable and qualitative consistency. Our purpose is to make high value products regarding individual specification to meet every user's requirement with the highest quality level. Optical grade Silicon is normally specified with a resistivity of 5 to 40 ohm-cm for best transmission about 10 μm. Silicon windows has a further pass band 30 to 100 microns which is effective only in very high resistivity material. SIL’TRONIX ST CAPABILITIES FOR SILICON LENSES Sil’tronix is growing its own silicon ingots by Czochralski pulling techniques (CZ). This pulling technic produces a Silicon which contains some oxygen, causing an absorption band at 5.8, 9.1 and 19.4 microns. To avoid this, Float Zone (FZ) material can be supplied which does not have this absorption. Our monocrystalline silicon optical windows is frequently used for laser mirrors and diffuser platethanks to its high thermal conductivity and low density. Our products are also useful as a transmitter in the 20 micron range and also are largely employed as targets in neutron physics experiments. XRD (X-ray diffraction analysis) SEM (scanning electron microscope) AFM (atomic force microscope) FTIR infrared Fluorescence spectroscopy analysis Synchrotron sample carrier radiation experiment Molecular beam epitaxial growth substrate

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