Optical emission spectrometer ICP-3000

ICP-OESfor metal analysisautomatic

- Over 70 elements can be measured - Stabilized Echelle optical system - Excellent detection limits, at ppb level for most elements - Wide linear dynamic range, from ppb to percentage - Real time operating monitor by software with build-in protection logic program Application - Rare earth metal - Silicon materials, magnetic materials processing industry - Metallurgical industry: analysis of impurity elements influencing the quality of metal materials. Water quality control - Petrochemical: measurements of more than 30 elements in crude oil - Pharmacy, hygiene, agriculture, environmental protection, commodities and food industry Performance Characteristics - Advanced optical design with a fully illuminated holographic grating, with spectral interference correction and high light throughput for improved detection limits - Wide wavelength range - Computer controlled plasma platform optimizes the viewing position to reduce interferences, improve SNR and minimize background emissions - Software controlled flow of carrier gas, plasma gas and auxiliary gas provide real time monitor as well as highly stability of flux - The torch position can be adjusted electrically, and the software has the automatic torch position optimization function - Sample waste drained by peristaltic pump ensures stable sample flow rate; Fast pump mode improves productivity - Rapid and accurate automatic coupling system ensures the ultimate power transfer efficiency and stability