analysis microscope / for research / scanning electron with focused ion probe



  • Technical applications:

    for analysis, for research

  • Type:

    scanning electron with focused ion probe


The world’s first fully integrated Xe plasma source focused ion beam (FIB) with scanning electron microscopy (SEM) enables extremely high ion currents up to 2 μA which results in increased milling speeds that can be up to 50 times faster compared to conventional Ga source FIBs. This makes FERA3 the ideal instrument for accomplishing large volume milling tasks that were once either time-consuming or practically impossible.

The focused ion beam scanning electron microscopes (FIB-SEMs) open up a world of new capabilities enabling applications which would otherwise not be possible to achieve with either standalone systems. The configuration in the FIB-SEM systems is such that the electron and ion beam focal points coincide, which results in the optimisation of many applications. This feature enables simultaneous SEM imaging during FIB milling tasks - a significant leap in terms of performance and throughput in all those FIB operations which demand extremely high level of precision. FERA3 features high-performance electronics for faster image acquisition, ultra-fast scanning system along with compensation of static and dynamic image aberrations and built-in scripting for user-defined applications.