process gas analyzer / residual gas / pressure / compact
QULEE CGM series

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Characteristics

  • Measured entity:

    process gas, residual gas

  • Measured value:

    pressure

  • Other characteristics:

    monitoring, compact, control, process

Description

COMPACT PROCESS GAS MONITOR - QULEE CGM SERIES
“Qulee” (pronounced as “KLEE”), is ULVAC’s latest model for residual gas analysis and gas monitoring during process. Feedback from facility engineers in various production lines are incorporated in the new product design offering utmost simplicity. The Qulee offers high accuracy and resolution even at high pressure (1Pa or less).Ideal for Sputtering System
Ideal for process monitoring of various sputtering sysytem
Differential Pumping System not Required
No differential pumping system required (at 1Pa (7.5×10-3 Torr,
1×10-2 mbar) or lower)
Integrated Display
No need for PC
Simple Operation
"One Click" function
Bake Out
Max 120˚C (248˚F) high temperature bake (250˚C (482˚F) when
sensors are removed)
Degas Function
Electron bombard degas
Protection and Maintenance Features
Ion source and secondary electron multiplier protection maintenance
help function
Traceability of analysis tube (patent pending)
Various Leak Tests are available
Helium leak test, air leak test, built-up test
Total Pressure Measurement
Capable of total pressure measurement (ionization gauge)
Qulee QCS is Included
This software is included and compatible with (Windows 7/8)
QIP (Quick Install Package system) is Included
Auto measuring package (refer to options catalog for details)
Applicable Standard
Conforms with CE
Process monitoring for PV, FPD, and semiconductor system
Residual gas analysis in PVD system
Impurities (H2O, etc.) control in PVD system
For leak testing