PVD deposition machine NEXUS DLC-X

thermal evaporationdiamond-like carbon

The NEXUS DLC-X Deposition System is an ultra-hard TFMH coating film technology which is resistant to corrosion. It is utilized to deposit uniform, dense and repeatable thin diamond-like carbon (DLC) films to ensure that TFMH slider overcoats and landing pads last longer. The NEXUS DLC-X benefits from having the first commercial Pulse Filtered Cathode Arc Source in the industry. This allows for a sub-20A overcoat thickness and supports enhanced step coverage for an increased process yield in comparison to previous generations. As well as film hardness and repeatability, the pulsed filtered cathodic arc provides outstanding uniformity. A dense, pin-hole free silicon seed layer is produced by the long throw, low pressure PVD. It is also able to perform a reactive PVD process. A stable operation from 75 volt to 300 volt beam energies is achieved by the tunable low energy NEXUS 420 ion beam etch source.