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MOCVD deposition machine / thin-film
TurboDisc® MaxBright® MHP™

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MOCVD deposition machine / thin-film MOCVD deposition machine / thin-film - TurboDisc® MaxBright® MHP™
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Characteristics

  • Method:

    MOCVD

  • Deposition type:

    thin-film

Description

The TurboDisc® MaxBright® MHP™ GaN MOCVD Multi-Reactor System represents the latest modular high performance system specially designed to produce excellent yield of up to 20% within-wafer wavelength uniformity improvement over the MaxBright of similar footprint, serviceability, benefits and layout configuration. The hardware advancements of the multi-reactor offers improved wavelength uniformity across all wafers to achieve higher yields. MaxBright MHP also offers lower ownership cost over the MaxBright. The system combines multiple high throughput MOCVD reactors in a modular 2- or 4-reactor cluster architecture to leverage Veeco’s production-proven Uniform FlowFlange® technology and automation expertise. Based on Veeco’s highly-successful K465i design, the system includes improved reactors that ensures expanded wafer capacity and advanced, proprietary, closed-loop thermal control technology.