Thin film CVD deposition machine
AcXys Technologies
AcXys Technologies provides a thin film coating equipment (UL-Coat) which allow thin deposit of Silicium.
It can be used to add new propieties to surfaces (barrier layer, hydrophoby, Optical layer, ...)
This device features a nozzle and a heating unit. Coating deposition is feasible on many materials. Small spots or wider areas can be processed as well.
It can be used to add new propieties to surfaces (barrier layer, hydrophoby, Optical layer, ...)
This device features a nozzle and a heating unit. Coating deposition is feasible on many materials. Small spots or wider areas can be processed as well.
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