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... The plasma source are incorporated into a vacuum chamber and generate high-density plasma. The plasma source can be used as Plasma Assisted Deposition ...
... has all the interfaces and flexibility required to integrate plasma technologies into complex scientific or industrial environments. This is the ideal equipment when the parameters of plasma processing need to be monitored ...
... of AcXys Technologies’ plasma power and high performance into a cost effective, compact and versatile machine. ULS technology – Integration made easy thanks to a compact design and nozzle – Local, yet powerful treatment ...
... RF Atom Source for atomic oxygen and atomic nitrogen Minimized power losses due to optimized design Discharge zone is manufactured from high-quality materials ensuring a minimal contamination of the beam Zero-ion current configuration ...
The TruPlasma DC Series 3000 (G2) is suitable for a number of DC sputtering processes – including use as a replacement for pulsed process power supplies. This is because progressive arc management offers a guarantee for the best layer qualities and a ...
... versatility with the new treatment solution. Tantec’s excited to present our SpinTEC30, an innovative treatment solution engineered for accuracy and effectiveness. Tantec’s innovative SpinTEC30 plasma ...
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