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Surface treatment plasma sources
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The plasma source are incorporated into a vacuum chamber and generate high-density plasma. The plasma source can be used as Plasma Assisted ...
The TruPlasma DC Series 3000 (G2) is suitable for a number of DC sputtering processes – including use as a replacement for pulsed process power supplies. This is because progressive arc management offers a guarantee for the best layer ...
RF Atom Source for atomic oxygen and atomic nitrogen Minimized power losses due to optimized design Discharge zone is manufactured from high-quality materials ensuring a minimal contamination of the beam Zero-ion ...
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