Ceramic vacuum chuck PLASMAPURE™ ALUMINA

Ceramic Components for Lithography & Wafer Inspection Perfect for next-generation lithography and wafer-handling applications, our ultra-pure ceramic components ensure minimal contamination and provide exceptionally long life performance. LITHOGRAPHY & WAFER INSPECTION COMPONENTS Resistant to chemical attack and thermally stable, our high-purity ceramic components are ideal for lithography processing, wafer handling (low contamination), and wafer inspection (extreme durability and hardness, dimensionally stable). Applications include: Photomask substrates Wafer chucks Wafer stage components Wafer tables RECOMMENDED LITHOGRAPHY & WAFER INSPECTION MATERIALS High-Purity Aluminas UltraClean™ Recrystallized Silicon Carbide CeraSiC, UltraSiC™ Direct Sintered Silicon Carbides PHOTOMASK SUBSTRATES CoorsTek photomask substrates are made from high-purity synthetic quartz glass to deliver superior UV and visible light transmittance, thermal stability, electrical insulation, low birefringence, and durable chemical stability. Advanced, scalable polishing technology makes these photomask substrates ideal for microscopic patterning from wafers to large flat panel displays (FPD). WAFER CHUCKS Our ultra-flat ceramic vacuum wafer chucks, stepper chucks, porous chucks, and electrostatic chucks improve yield management for semiconductor wafer processing. Low-surface-contact configurations minimize the risk of back-side particles for sensitive applications. Our wafer chucks provide: Ultra-flat capabilities Mirror polish Exceptional light weight High stiffness Low thermal expansion Φ 300 mm diameter and beyond Extreme wear resistance