Corning Tropel Corporation designed the UltraFlat 200 Mask System specifically for the photomask industry. It delivers the lowest measurement uncertainty for ever-tightening mask flatness specifications. Shrinking device features require not only flatter wafers, but flatter professional masks.

The UltraFlat system is used to measure flatness of photoblanks and photomasks throughout every stage of manufacturing and use, including, substrate polishing, coating and patterning to analyze film stress, and verification.

UltraFlat system utilizes near-normal incidence interferometry, rock solid structural design, state-of-the-art optical fabrication techniques and Tropel's renowned phase shifting analyzers software to deliver 20 nanometer measurement uncertainty.

The system is NIST traceable and provides measurements that conform to SEMI standards. An automated photomask handling and measurement configuration is also available.