Our 4-station indexing sintering furnace is our highest throughput model tailored for high temperature sintering of electronic components. Four loads are processed simultaneously, creating a semi-continuous process sintering process.
The furnace has a usable zone of 12” diameter x 22” high (305 mm x 559 mm), this design is ideal for high volume large batch processing.
This furnace features five chambers, a bottom indexing chamber containing a transfer mechanism, a chamber for loading and unloading, a heating chamber, one for cooling and lastly one for controlled oxidation. During normal operation, all chambers are isolated from one another.
A hydraulic lift and motorized indexing mechanism move the load stacks from one station to the next. Depending on process parameters, this furnace produces a sintered load every 45 minutes.
The hot zone is capable of temperatures up to 2100°C and is manufactured with tantalum or tungsten.
A high throughput 10″ or 16″ diffusion pumping system handles load out-gassing. The HMI computer interface runs completely automated cycles start to finish, integrating with production networks to provide product tracking and recipe selection.