The Tropel® UltraFlatTM 200 Mask System was designed specifically for the photomask industry. It delivers the lowest measurement uncertainty for ever-tightening mask flatness specifications. Shrinking device features require not only flatter wafers, but flatter masks.
The UltraFlatTM system is used to measure flatness of photoblanks and photomasks throughout every stage of manufacturing and use, including substrate polishing, coating and patterning to analyze film stress, and verification.
The UltraFlatTM system utilizes near-normal incidence interferometry, rock-solid structural design, state-of-the-art optical fabrication techniques and Tropel's renowned phase-shifting analysis software to deliver 20 nanometer measurement uncertainty.
The system is National Institute of Standards and Technology (NIST)-traceable and provides measurements that conform to SEMI standards. An automated photomask handling and measurement configuration is also available.