NDIR gas sensor Gasboard-2060

for semiconductor gas purification monitoranalogvoltage output

Overview
Gasboard-2060 is a high-performance SiF4 gas sensor designed for real-time semiconductor chamber cleaning endpoint detection (EPD) in silicon-based CVD deposition chambers. Based on Non-Dispersive Infrared (NDIR) technology with a specially designed gas chamber, it provides highly selective and precise SiF4 concentration measurement in semiconductor chamber cleaning processes.

Gasboard-2060 monitors SiF4 concentration in real time, enabling fast and precise chamber cleaning endpoint indication to reduce cleaning time and gas consumption while minimizing chamber wear and extending component service life.

Featuring a modular design, Gasboard-2060 allows easy installation. It supports both analog and digital communication outputs, enabling calibration and adjustment functions for convenient integration and maintenance.

Features

• NDIR technology for high sensitive and accurate SiF4 measurement.
• Fast response for precise deposition chamber cleaning endpoint determination.
• Low zero drift and high repeatibility for consistent measurement performance.
• Modular design for easy system integration.
• Analog and digital communication outputs.

Specifications
Measurement: SiF4
Detection Principle: NDIR
Range: (0.0-0.2) Absorbance
Response Time: T902s
Data Reporting Rate: 0.5s
Analog Output: 1-10VDC
Power Input: 15VDC (≤300mA), 24VDC
Digital Communication: RS232
Sampling Port: KF16
Dimensions: 200×120×75.5mm
Leak Rate: 1×10-8 Pa·m3/s (He)
Operating Temperature: (565) ℃

Notes
1. All data in the table were measured under standard atmospheric pressure.
2. Measurement calibration gases were provided by a unit certified by the national metrology authority. All gases were diluted in dry nitrogen with a purity of ≥ 99.999%.
3. The above performance specifications were determined after calibration. All sensors were 100% calibrated during production.
4. Measurements were performed at 25 °C ambient temperature.
5. Measured at a flow rate of 5L/min.