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Cleaning solvent
for etching residues

Cleaning solvent - Fujifilm NDT Systems - for etching residues
Cleaning solvent - Fujifilm NDT Systems - for etching residues
Cleaning solvent - Fujifilm NDT Systems - for etching residues - image - 2
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Characteristics

Function
cleaning
Applications
for etching residues

Description

Aqueous post etch cleaners compatible with aluminum, copper, and advanced metal alloys, anti-reflective layers, SiO2 and ultra low-k dielectrics Highly effective aqueous post etch cleaners compatible with Al, Cu, and ultra low-k BEOL processes. Features & Benefits Wide process latitude Compatible with spray and batch tool applications Cost of ownership advantage over solvent-based cleaners - Direct DI water rinse Eliminates added rinsing chemical cost and increases throughput by eliminating chemical steps Safe and easy to use Compatible with advanced process equipment materials Superior metals, ILD, and ULK compatibility Product purity is continuously verified through the use of state-of-the-art analytical tools Manufactured and packaged at plants in US and Asia Different grades depending on the etchant type Certain products are offered with or without surfactant See our Applications overview for the different etchant types Packaging options: 4 x 4L Bottles 200L Drums (one-way or returnable) 1000L Totes (one-way or returnable) Bulk Delivery (depends on location)

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Cleaners and Etchants

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