Cleaning solvent

for electronicsfor etching residues

Etchants A comprehensive range of specialty and proprietary etchant blends We offer a broad range of diluted Hydrofluoric (HF) ratios, specialty Buffered Oxide Etchants (BOE) - with/without surfactant, Mixed Acid etchants (MAE) & specialty metal etchants Product Lineup Buffered Oxide Etchants Fujifilm has advanced capabilities for the precise blending of Buffered Etchants with tight assay specification ranges, available in multiple NH4F:HF ratios Utilized to etch SiO2 films. Utilized as pre-diffusion and pre-metallization surface preparations Formulated from high purity 49% Hydrofluoric Acid and high purity 40% Ammonium Fluoride. Available with and without surfactant. Dilute HF Fujifilm has advanced capabilities for the precise blending of dilute HF with tight assay specification ranges. Freckle Etch For the removal of residual silicon nodules left after etching aluminum-silicon-copper layers. Specialty Metal Etchants For the selective removal of specific metal layers Fujifilm offers various specialty etchants, including Specialty Aluminum Etchants, Immersion etchants for aluminum metallization layers - Available with or without the Fujifilm Aluminum Etch Surfactant (AES) Custom Engineering.