PVD deposition machine LTMC

CVDvacuum

Overview
LTMC equipment performs low temperature plasma chemical vapor deposition (PCVD) to create a metal-ceramic diffusion layer on metal components. Under vacuum and below 150°C, plasma activates silicon-, boron- and nitrogen-containing process gases which react with and diffuse into the substrate surface, forming a graded composite ceramic layer that increases surface hardness and provides solid-lubricating phases.

Key performance summary

• Chamber volume: 3.4 m³
• Effective treatment area: 1,200 × 1,100 × 550 mm
• Maximum loading weight: 3,000 kg
• Typical process time: 3–5 hours (depends on workpiece and process parameters)
• Operating / maximum working temperature: below 150°C

Key benefits of LTMC technology

• Low-temperature surface hardening: raises surface hardness while limiting thermal effects on substrate, suitable for thin-walled and precision parts.
• Ceramic diffusion bonding: Si, B and N form ceramic phases that diffuse to depths of ~10–20 μm, producing a graded, strongly bonded wear-resistant layer.
• Self-lubricating surface: formation of phases such as hexagonal boron nitride provides solid lubrication to reduce friction while retaining hardness.
• Internal and external surface treatment: adjustable electrode shapes enable treatment of internal walls and thin-walled components.

Applications and compatible materials

• Typical applications: cylinder liners, piston rings, cutting tools, molds, camshafts, rocker arms, bearings, gears and similar components requiring wear resistance and low friction.
• Treatable materials: steels, titanium alloys, aluminum alloys, cemented carbide (examples tested: 20CrNiMo, TC17, YG6, pure copper).

Process and functional details
LTMC uses low-temperature PCVD: plasma activates reactive gases (Si-, B- and N-containing), forming ceramic phases that diffuse into the near-surface region to depths of 10–20 μm, creating a graded composite layer with wear-resistant and self-lubricating properties.

Product parameters
Equipment: LTMC Low Temperature Metal Ceramic Coating Equipment
Process technology: Low Temperature Plasma Chemical Vapor Deposition (PCVD)
Chamber volume: 3.4 m³
Effective treatment area: 1,200 × 1,100 × 550 mm
Maximum loading weight: 3,000 kg
Equipment dimensions (L × W × H): 8,770 × 5,100 × 2,320 mm
Ceramic-forming elements: silicon, boron, nitrogen
Process gases: N2 / SiH4 / B2H6
Ceramic diffusion depth: 10–20 μm
Gas control modes: chamber pressure control or gas flow control
Vacuum pump configuration: rotary vane pump + Roots pump
Pumping speed: 1,200 m³/h
Typical process time: 3–5 hours
Operating temperature: below 150°C

Selected FAQ highlights

• What is LTMC equipment used for? — Low-temperature metal-ceramic diffusion treatment to improve surface hardness, wear resistance and self-lubricating performance for components such as cylinder liners, bearings, gears, cutting tools and molds.
• What is the treatment temperature? — Below 150°C (maximum working temperature 150°C).
• What materials can be treated? — Steel, titanium alloys, aluminum alloys, cemented carbide (examples tested: 20CrNiMo, TC17, YG6, pure copper).
• Can internal walls and thin-walled parts be treated? — Yes. Electrode shapes can be adjusted for internal-wall and thin-walled component treatment (e.g., 1.5 mm thin-walled liners).
• What is the maximum loading capacity? — 3,000 kg; effective treatment area 1,200 × 1,100 × 550 mm; chamber volume 3.4 m³.

Technical specifications

• Series / name: LTMC
• Process: Low Temperature Plasma Chemical Vapor Deposition (PCVD)
• Chamber volume: 3.4 m³
• Effective treatment area: 1,200 × 1,100 × 550 mm
• Maximum loading weight: 3,000 kg
• Equipment dimensions: 8,770 × 5,100 × 2,320 mm
• Operating temperature: below 150°C
• Typical cycle time: 3–5 hours (depends on part and settings)
• Ceramic-forming elements: silicon, boron, nitrogen
• Process gases (examples): N2 / SiH4 / B2H6
• Ceramic diffusion depth: 10–20 μm
• Gas control: chamber pressure control or gas flow control
• Vacuum system: rotary vane pump + Roots pump
• Pumping speed: 1,200 m³/h
• Treatable materials: steel, titanium alloys, aluminum alloys, cemented carbide
• Capabilities: internal and external surface treatment, thin-walled component processing, adjustable electrode shapes