CVD deposition machine HCTE-VCM-003

CVD deposition machine
CVD deposition machine
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Characteristics

Method
CVD

Description

Product introduction: The function of the chemical vapor deposition system is to deposit thin films on the substrate, improve the material properties, manufacture functional devices, achieve surface modification, precisely control the thickness of the thin films, improve the product quality, assist in the research and development of new materials, and be used in integrated circuit manufacturing, etc., with the advantages of high process controllability, capable of large-scale production, and possibly lower cost.
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.