Focused ion beam system MR8000

This FPD photomask defect repair system uses focused ion beam (FIB) technology and supports large scale photomasks. A rotation mechanism inside the chamber minimizes an installation area. Supports large flat panel dispray masks Can take large photomasks up to a maximum size of 1400×1600 mm. Can deposit high adhesion film Can form film with adhesion strength comparable to Cr film on the mask using a special gas. Can repair gray tone masks FIB carbon deposition function allows repair of clear defects in gray-tone masks that use half-tone films. Mask sizes - Max: 1400×1600 mm Min: 6-inch Max thickness: 15 mm Min thickness: 5 mm Repair accuracy - 50 nm@3σ Clear defect repair method - FIB carbon deposition Opaque defect repair method - Gas-assisted etching