Multi-sensor analyzer Semion

for plasma reactorretarding fieldreal-time

The Semion Multi Sensor retarding field energy analyser (RFEA) measures the uniformity of ion energies hitting a surface using a number of plasma measurement sensors. This cutting edge retarding field energy analyser (RFEA) also measures the uniformity of ion flux, negative ions and bias voltage at any position inside a plasma chamber. The Semion Multi Sensor retarding field energy analyser (RFEA) allows users to change their plasma input parameters such as power, pressure, frequencies and chemistries in real time to find their optimum ion energy distribution and ion flux uniformity for their application. The Semion Multi Sensor Retarding Field Energy Analyser (RFEA) measures the ion energy uniformity, ion flux uniformity, negative ion uniformity and Vdc at the substrate position inside a plasma chamber. The Semion Multi Sensor is primarily used for researching wafer uniformity in industrial plasma applications but it also finds applications in research. Users in the semiconductor community are concerned with the uniformity of ion interactions with the substrate and this holds true for coatings, etching, plasma sputtering, PECVD and ion beam applications. With ever increasing substrate sizes plasma uniformity becomes increasingly critical. The Semion Multi Sensor retarding field energy analyser (RFEA) helps save time to confirm plasma uniformity models, develop new uniform plasma processes and experiments that use plasma, design of larger plasma tools and plasma research.