chemical pump / electric / diaphragm / industrial
EWN-Y series

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chemical pump chemical pump - EWN-Y series


  • Media:

    for chemicals

  • Operation:


  • Technology:


  • Domain:


  • Other characteristics:

    with digital control, electromagnetic, chemical process, metering

  • Flow:

    Max.: 25.2 l/h (6.6571 us gal/h)

    Min.: 0 l/h (0 us gal/h)

  • Pressure:

    Max.: 1,400,000 Pa (203.053 psi)

    Min.: 0 Pa (0 psi)

  • Power:

    Max.: 24 W (0.03 hp)

    Min.: 20 W (0.03 hp)


High-End electromagnetic metering pumps with precise flow monitoring, feedback & control
The EWN-Y electromagnetic pump combined with EFS flow sensor (option) provides accurate real time control & display of dosing rate. The required flow rate is simply input to the pump. Through feedback to the EFS sensor, the pump constantly adjust its speed to maintain the set dosing rate – even under changing temperature, viscosity, or suction & discharge pressure conditions. The EWN-Y gives a proportional 4-20mA output signal of dosing rate and displays operating history such as total flow volume and power on time.

High resolution
The stroke rate can be set with 1spm increments in between 1 and 360spm. The stroke length adjustment further assists fine adjustment that the stroke rate adjustment cannot reach. Contentious precise chemical feeding is now available.

Multi voltage
The use of the multi voltage circuit design allows the pump to work anywhere in the world.

A wide variation
PVC, GFRPP, PVDF or SUS316 pump head, B- or C-type drive unit and each diaphragm size are available.

Built-in controller
The EWN-Y has the mode of 1:1 operation, multiplier/divider programming control (digital signal), proportional control (analogue signal rigid & variable) and batch mode and can dedicate itself to a particular purpose by selecting a suitable mode. Also, the flow rate indication can be converted from spm to l/h or gph.